TSMC 28nm GPUs "late 2010 or very early 2011"

[josiahsuarez]

http://www.theinquirer.net/inquirer/...sues-explained

He then moved on to explaining what the company plans to do next with its 28nm roadmap. It will start with a 28nm Low Power (28LP) silicon oxynitride, followed a quarter later by the 28nm high performance (28HP) high-K metal gate process. Despite it being the first high-K metal-gate process, Chiang believes that TSMC will be able to migrate the technology as it moves forward with 22nm and 20nm nodes. 28nm should be introduced by Q3 2010, we garnered.

Further along the roadmap comes the aforementioned 22nm node. Chiang expects to see a more mature second-generation high-K metal-gate process kick in. The first 22nm process will be a high-performance one (22HP), followed 2 quarters later by the low-power version (22LP). These should be in place by Q3 2012 and Q1 2013, respectively.

Considering TSMC’s major clients are the likes of AMD, Nvidia, Broadcom and Qualcomm. not to mention Intel, it seems that it's taking fairly important measures to reassure its clientele about its manufacturing. Of course we should expect a reaction from Global Foundries soon, as it are developing competing processes in their own house.

So, if you’re a GPU buff, late 2010 or very early 2011 would be a good estimate for a new generation of GPUs. That, or smartphones. We'll have to wait and see. >µ

[josiahsuarez]

http://www.xbitlabs.com/news/other/d..._the_Year.html

28nm On Track with the Roadmap

Instead of 32nm fabrication process, TSMC concentrates on 28nm technologies. Initially the company plans to launch 28nm SiON/Poly process for low-power devices and later on it will roll-out high-k metal gate (HKMG) based technologies for more advanced products.

“The first node we are going to release for the 28nm will be called the 28LP. This is our poly gate and silicon oxide nitrate version. We will establish production at the end of June this year, about four months from now, and this is for the low power application. […] The first HKMG process we call 28HP for the high performance application will be introduced by the end of September this year, and followed by three months later December will be the 28HPL, which is [our] first high-k metal gate introduction for the low power application,” said Mr. Chiang.